JPH0516372B2 - - Google Patents

Info

Publication number
JPH0516372B2
JPH0516372B2 JP63056868A JP5686888A JPH0516372B2 JP H0516372 B2 JPH0516372 B2 JP H0516372B2 JP 63056868 A JP63056868 A JP 63056868A JP 5686888 A JP5686888 A JP 5686888A JP H0516372 B2 JPH0516372 B2 JP H0516372B2
Authority
JP
Japan
Prior art keywords
silica
acid
purity
purity silica
chelating agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63056868A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01230422A (ja
Inventor
Hiroyuki Kashiwase
Yutaka Konose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP5686888A priority Critical patent/JPH01230422A/ja
Publication of JPH01230422A publication Critical patent/JPH01230422A/ja
Publication of JPH0516372B2 publication Critical patent/JPH0516372B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
JP5686888A 1988-03-10 1988-03-10 高純度シリカ及びその製造方法 Granted JPH01230422A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5686888A JPH01230422A (ja) 1988-03-10 1988-03-10 高純度シリカ及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5686888A JPH01230422A (ja) 1988-03-10 1988-03-10 高純度シリカ及びその製造方法

Publications (2)

Publication Number Publication Date
JPH01230422A JPH01230422A (ja) 1989-09-13
JPH0516372B2 true JPH0516372B2 (en]) 1993-03-04

Family

ID=13039402

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5686888A Granted JPH01230422A (ja) 1988-03-10 1988-03-10 高純度シリカ及びその製造方法

Country Status (1)

Country Link
JP (1) JPH01230422A (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3400548B2 (ja) * 1993-06-29 2003-04-28 三菱レイヨン株式会社 高純度球状シリカの製造方法
CN105263860B (zh) * 2013-05-20 2017-06-27 日产化学工业株式会社 硅溶胶以及含二氧化硅的环氧树脂组合物
CN112678831B (zh) * 2021-02-02 2022-06-07 福建省三明正元化工有限公司 一种利用氧化石墨烯废液制备二氧化硅的方法
JP2024179264A (ja) * 2023-06-14 2024-12-26 株式会社アドマテックス 高純度溶融球状シリカ、及びこれを含む電子機器用樹脂組成物、並びにこれを含む化粧品

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60115641A (ja) * 1983-11-25 1985-06-22 Denki Kagaku Kogyo Kk 封止樹脂用充填剤及びその組成物
JPS6140811A (ja) * 1984-07-31 1986-02-27 Nippon Chem Ind Co Ltd:The 溶融用水和シリカおよびこれを用いた溶融シリカの製造方法
JPS61186216A (ja) * 1985-02-12 1986-08-19 Denki Kagaku Kogyo Kk 球状シリカ粒子の製造方法
JPS6212608A (ja) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The 高純度シリカ及びその製造方法
JPS6212609A (ja) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The 改質溶融球状シリカおよびその製造方法
JPS6296311A (ja) * 1985-10-24 1987-05-02 Denki Kagaku Kogyo Kk 高純度球状シリカフイラ−の製造方法

Also Published As

Publication number Publication date
JPH01230422A (ja) 1989-09-13

Similar Documents

Publication Publication Date Title
JPH05503066A (ja) アルカリ金属珪酸塩の製造方法
JP5424562B2 (ja) 水酸化セシウム溶液の製造法
JP2514761B2 (ja) 高純度溶融シリカの製造方法
JPS6212608A (ja) 高純度シリカ及びその製造方法
JPS60204613A (ja) 高純度シリカゲルの製造方法
JPH072512A (ja) 岩石から純粋な無定形シリカの製造方法
JP2542797B2 (ja) 高純度シリカの製造方法
JPH0796447B2 (ja) 高純度シリカの製造方法
JPS61158810A (ja) 高純度シリカゾルの製造法
JPH0516372B2 (en])
US4693878A (en) Process for the production of soluble alkali silicates
JPH0124728B2 (en])
JPH055766B2 (en])
JP4022640B2 (ja) 塊状高純度シリカ及びその製造方法
JPS6321212A (ja) 高純度シリカの製造方法
JPS6117416A (ja) 高純度シリカおよびその製造方法
JPH075289B2 (ja) 低トリウム高純度シリカの製造方法
JPH0118006B2 (en])
JP2769113B2 (ja) 高純度シリカの製造方法
JPH0121092B2 (en])
JPH0124729B2 (en])
JPS6090812A (ja) 高純度シリカの製造法
JPH0121091B2 (en])
JPS6321213A (ja) 高純度シリカの製造方法
JPH0466812B2 (en])

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090304

Year of fee payment: 16